Ionimac I501 is a laboratory equipment for the deposition of thin layers by PVD (Physical Vapor Deposition) characterized by a compact structure minimizing the occupied space. It has a number of possibilities for use and adapts easily to specialized works. This, thanks to the adjustable orientation of the chamber between 0 and 90 degrees (vertical or horizontal cathodes) and to the easy acces of its parts. Maintenance is simplified and the changing of the cathodes and substratum-racks very rapid. It is even possible to change the chamber itself.
Two " magnetron " cathodes assembled face to face and working simultaneously or alternately, are fitted in the chamber. The targets have a diameter of 120 mm.
Vacuum is ensured by a primary pump of 32 m^3 / hour and by a turbomolecular pump with a vacuum speed of 450 l / s, cooled in water.
The Interior of the chamber measures 370 mm x 300 mm x 100 mm.
The rotary, manual or motorized substratum-racks can be replaced by a plate when the chamber is in horizontal position.
The basic version of the installation enables working in DC etching and DC deposition. The deposition can be carried out by using the cathodes simultaneously or alternately, the substratum can be polarized with a DC generator.
Thanks to 3 mass flowmeters it is possible to work in reactive or non-reactive deposition (Argon + 2 reactive gases).
The target-substratum distance is adjustable according to need, by a set of crosspieces.
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